As a post-doc at the European Synchrotron Radiation Facility (ESRF), he applied a high-energy x-ray reflectivity technique to the study of buried interfaces (a few Å thick) between two silicon wafers bonded by molecular interactions, and acquired expertise in surface sensitive x-ray scattering techniques for in-situ structural studies of semiconductor surfaces. He recently developed an ion beam technique to obtain self-organized nanodot arrays.

He has authored 10 publications, and been involved in several international collaborations. He is now “Maître de Conférences” at University Paris XI and researcher at CSNSM-Orsay. He is mainly concerned with ion irradiation techniques for the controlled modification of materials\'properties at the nanometric scale.